Quote Mode 硅抛光液，硅晶片抛光液
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AI AI Product Introduction
硅抛光液专为半导体硅晶片精密抛光设计，主要成分为纳米级二氧化硅，pH值稳定，粒径分布均匀，确保表面粗糙度Ra<0.5nm。适用于6-12英寸晶片，化学机械抛光(CMP)工艺，兼容主流设备。起订量25L，保质期12个月，符合SEMI标准。建议根据晶片直径和工艺要求选择粒径规格，采购时需提供材质证书(MSDS)以确保无金属离子污染。
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硅抛光液，硅晶片抛光液
发货地：深圳市
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硅抛光液，硅晶片抛光液
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